The aim of the volume is to help provide understanding of electrochemical phenomena and materials at the nanoscale through modeling and numeric simulations. It is also designed to serve as a means to create and use structures.
With advances in information-age technologies, the field ofelectroplating has seen dramatic growth in the decade since theprevious edition of Modern Electroplating was published. Thisexpanded new edition addresses these developments, providing acomprehensive, one-stop reference to the latest methods andapplications of electroplating of metals, alloys, semiconductors,and conductive polymers.
With special emphasis on electroplating and electrochemicalplating in nanotechnologies, data storage, and medicalapplications, the Fifth Edition boasts vast amounts of new andrevised material, unmatched in breadth and depth by any other bookon the subject. It includes:
Easily accessible, self-contained contributions by over thirtyexperts
Five completely new chapters and hundreds of additionalpages
A cutting-edge look at applications in nanoelectronics
Coverage of the formation of nanoclusters and quantum dots usingscanning tunneling microscopy (STM)
An important discussion of the physical properties of metal thinfilms
Chapters devoted to methods, tools, control, and environmentalissues
And much more
A must-have for anyone in electroplating, including technicians,platers, plating researchers, and metal finishers, ModernElectroplating, Fifth Edition is also an excellent reference forelectrical engineers and researchers in the automotive, datastorage, and medical industries.
-Corrosion on the First Edition of Fundamentals of ElectrochemicalDeposition
From computer hardware to automobiles, medical diagnostics toaerospace, electrochemical deposition plays a crucial role in anarray of key industries. Fundamentals of ElectrochemicalDeposition, Second Edition is a comprehensive introduction to oneof today's most exciting and rapidly evolving fields of practicalknowledge.
The most authoritative introduction to the field so far, the bookpresents detailed coverage of the full range of electrochemicaldeposition processes and technologies, including:
* Metal-solution interphase
* Charge transfer across an interphase
* Formation of an equilibrium electrode potential
* Nucleation and growth of thin films
* Kinetics and mechanisms of electrodeposition
* Electroless deposition
* In situ characterization of deposition processes
* Structure and properties of deposits
* Multilayered and composite thin films
* Interdiffusion in thin film
* Applications in the semiconductor industry and the field ofmedicine
This new edition updates the prior edition to address the newdevelopments in the science and its applications, with new chapterson innovative applications of electrochemical deposition insemiconductor technology, magnetism and microelectronics, andmedical instrumentation. Added coverage includes such topics asbinding energy, nanoclusters, atomic force, and scanning tunnelingmicroscopy.Example problems at the end of chapters and otherfeatures clarify and improve understanding of the material.
Written by an author team with extensive experience in bothindustry and academe, this reference and text provides awell-rounded introduction to the field for students, as well as ameans for professional chemists, engineers, and technicians toexpand and sharpen their skills in using the technology.