Victoria A. Bardos, Managing Editor
This book presents an overview of the technological advances that have occurred since the publication of the Editors earlier book High Voltage Vacuum Insulation: The Physical Basis. In this latest book, contributions from internationally recognized professionals and researchers in the field provide expanded treatment of the practical aspects of the subject. High Voltage Vacuum Insulation: Basic Concepts and Technological Practice provides a modern working manual for this specialized technology that is generic to a wide range of applications. The format makes the text suitable for use as a basis for special topic lecture courses at either the undergraduate or graduate level.Provides the fundamental physical concepts of the subjectFocuses on practical applicationsGives a historical survey of the fieldIncludes a detailed account of system design criteriaReviews theoretical models developed to explain the pinhole phenomenaPresents results of a series of experimental investigations on the subject
In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.
This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
assumes only basic mathematical knowledge on the part of the reader and includes more than 100 discussion questions and some 70 problems, with solutions as well as further supplementary material available free to lecturers from the Wiley-VCH website.
This book is composed of seven chapters, and begins with an introduction to the general concepts of time dependent flow, including induced current, the techniques of linearization, calculating variational transit time, and obtaining equivalent circuits. The following chapters present the classical linear analysis, which includes the space-charge effects, with several applications. These chapters also explore the existence of a maximum stable current in a space-charge limited diode. The discussion then shifts to the basics of high velocity, klystron, gap with nonuniform field distributions, and the application of the multicavity klystron. This text further covers the analysis and examples of crossed-field gaps. The final chapters deal with the fundamentals of velocity and current distributions obtained from common electron emitters, with some attempt to show how the multivelocity streams evolve into single-velocity equivalents needed for the methods of earlier chapters. Results of applying the Lagrangian starting analysis to semiconductor diode regions, necessarily from a new equation of motion, are also provided.
This book is intended for graduate courses, seminars, and research studies.
The text discusses the practical aspects of building a confocal scanning optical microscope or optical interference microscope, and the applications of these microscopes to phase imaging, biological imaging, and semiconductor inspection and metrology.A comprehensive theoretical discussion of the depth and transverse resolution is given with emphasis placed on the practical results of the theoretical calculations and how these can be used to help understand the operation of these microscopes.Provides a comprehensive introduction to the field of scanning optical microscopy for scientists and engineersExplains many practical applications of scanning optical and interference microscopy in such diverse fields as biology and semiconductor metrologyDiscusses in theoretical terms the origin of the improved depth and transverse resolution of scanning optical and interference microscopes with emphasis on the practical results of the theoretical calculationsConsiders the practical aspects of building a confocal scanning or interference microscope and explores some of the design tradeoffs made for microscopes used in various applicationsDiscusses the theory and design of near-field optical microscopesExplains phase imaging in the scanning optical and interference microscopes
The overall layout of the book is similar to that of the previous two editions however, there are considerable changes in emphasis and several key additions including:
•up-to-date presentation of modern theories of liquid-vapour coexistence and criticality
•areas of considerable present and future interest such as super-cooled liquids and the glass transition
•the area of liquid metals, which has grown into a mature subject area, now presented as part of the chapter ionic liquids
•Provides cutting-edge research in the principles of liquid-state theory
•Includes frequent comparisons of theoretical predictions with experimental and simulation data
•Suitable for researchers and post-graduates in the field of condensed matter science (Physics, Chemistry, Material Science), biophysics as well as those in the oil industry
The selection and organization of the material is in a form to prepare the reader to reason independently and to deal just as independently with available theoretical results and experimental data. The subjects dealt with include:
- electronic transport theory based on the test-particle and correlation-function concepts;
- scattering by phonons, impurities, surfaces, magnons, dislocations, electron-electron scattering and electron temperature;
- two-phonon scattering, spin-flip scattering, scattering in degenerate and many-band models.
CMOS Processors and Memories is divided into two parts: processors and memories. In the first part we start with high performance, low power processor design, followed by a chapter on multi-core processing. They both represent state-of-the-art concepts in current computing industry. The third chapter deals with asynchronous design that still carries lots of promise for future computing needs. At the end we present a “hardware design space exploration” methodology for implementing and analyzing the hardware for the Bayesian inference framework. This particular methodology involves: analyzing the computational cost and exploring candidate hardware components, proposing various custom architectures using both traditional CMOS and hybrid nanotechnology CMOL. The first part concludes with hybrid CMOS-Nano architectures.
The second, memory part covers state-of-the-art SRAM, DRAM, and flash memories as well as emerging device concepts. Semiconductor memory is a good example of the full custom design that applies various analog and logic circuits to utilize the memory cell’s device physics. Critical physical effects that include tunneling, hot electron injection, charge trapping (Flash memory) are discussed in detail. Emerging memories like FRAM, PRAM and ReRAM that depend on magnetization, electron spin alignment, ferroelectric effect, built-in potential well, quantum effects, and thermal melting are also described.
CMOS Processors and Memories is a must for anyone serious about circuit design for future computing technologies. The book is written by top notch international experts in industry and academia. It can be used in graduate course curriculum.
This book addresses the fundamental issues underlying the semiconductor test discipline. The test engineer must understand the basic principles of semiconductor fabrication and process and have an in-depth knowledge of circuit functions, instrumentation and noise sources.Introduces a novel component-testing philosophy for semiconductor test, product and design engineersBest new source of information for experienced semiconductor engineers as well as entry-level personnelEight chapters about semiconductor testing
The Future of the Mind brings a topic that once belonged solely to the province of science fiction into a startling new reality. This scientific tour de force unveils the astonishing research being done in top laboratories around the world—all based on the latest advancements in neuroscience and physics—including recent experiments in telepathy, mind control, avatars, telekinesis, and recording memories and dreams. The Future of the Mind is an extraordinary, mind-boggling exploration of the frontiers of neuroscience. Dr. Kaku looks toward the day when we may achieve the ability to upload the human brain to a computer, neuron for neuron; project thoughts and emotions around the world on a brain-net; take a “smart pill” to enhance cognition; send our consciousness across the universe; and push the very limits of immortality.
In this work Einstein intended, as far as possible, to give an exact insight into the theory of relativity to those readers who, from a general and scientific philosophical point of view, are interested in the theory, but who are not conversant with the mathematical apparatus of theoretical physics. The theory of relativity enriched physics and astronomy during the 20th century.(Relativity: The Special and the General Theory by Albert Einstein, 9789380914220)
The book is packed with specific methods that can be applied quickly and accurately to almost any industry and any product to control documentation, request changes to the product, implement changes and develop bills of material.
The result is a powerful communications bridge between the engineering function and ‘the rest of the world’ that makes rapid changes in products and documentation possible. With the help of the simple techniques in the handbook, companies can gain and hold their competitive advantages in a world that demands flexibility and quick reflexes – and has no sympathy for delays.
The new edition sets EDC/CM in the context of Product Lifecycle Management (PLM), providing guidance on choosing, purchasing and implementing PLM software systems. Watts guides the reader to harness these tools and techniques for business objectives including Process Improvement and time-to-market.Solid, pragmatic ideas for real product and process cost reduction. According to one reviewer: ‘most books focus on the basics without examining all facets of each process area or functional area. This may be good for quickly learning, but it will only take the reader so far. Mr. Watts imparts the same information, but invites the reader to think and to consider strengths and weaknesses of processes and procedures. The copious examples, illustrations and breadth of topics covered make this book "the" reference on EDC and CM.’Strategic emphasis shows how processes may be integrated and tears down the ‘wall’ between Engineering and OperationsThorough description of Product Lifecycle Management software tools
Volume I focuses on physics and mechanics of micro- and opto-electronic structures and systems, i.e., on the science underpinnings of engineering methods and approaches used in microelectronics and photonics. Volume II deals with various practical aspects of reliability and packaging of micro- and opto-electronic systems. Internationally recognized experts and world leaders in particular areas of this branch of applied science and engineering contributed to the book.
The book is supported by detailed, proven and effective commission templates, plus extensive commissioning scenarios that enable the reader to learn the context of good commissioning practice from an experienced commissioning manager. It focuses on the critical safety assessment and inspection regimes necessary to ensure that new plants are compliant with OSHA and environmental requirements. Martin Killcross has brought together the theory of textbooks and technical information obtained from sales literature, in order to provide engineers with what they need to know before initiating talks with vendors regarding equipment selection.Unique information from a respected, global commissioning manager: delivers the know-how to succeed for anyone commissioning new plant or equipmentComes with online commissioning process templates that make this title a working tool kit as well as a key reference Extensive examples of successful commissioning processes with step-by-step guidance enable readers to understand the function and performance of the wide range of tasks required in the commissioning process
*Completely revised and updated throughout
*The definative guide for process engineers and designers
*Covers a complete range of basic day-to-day operation topics
Designed for those new to FTIR, but with enough reference material to appeal to journeyman and expert spectroscopists, this book does not demand any extensive familiarity with chemistry or physics. Specializing in concise and comprehensible explanations of FTIR topics, the author introduces the field of infrared spectroscopy, including the strengths and weaknesses of FTIR as a chemical analysis technique. He then describes the instrument itself and explores topics such as how an interferometer generates a spectrum, optimization of spectral quality, and which tests are used to monitor instrument health.
The book discusses how to properly use spectral processing to increase the information of a spectrum without damaging the data and takes considerable care in instructing on sample preparation, as good sample preparation constitutes half the battle in extracting good data. The final chapters examine single analyte quantitative analysis and conclude with an overview of infrared microscopy.
Drawing on the experience and knowledge of the author as both a professor and practitioner, Fundamentals of Fourier Transform Infrared Spectroscopy offers up-to-date information given in clear, easily understood language to appeal to beginner and expert spectroscopists alike. The author maintains a website and blog with supplemental material. His training course schedule is also available online.
For professionals in the coating and drying industry, the world is a demanding place. New, technically complex products such as fuel cell membranes, thin film batteries, solar cells, and RFID chips require coatings of extreme precision. With the bar raised so high, understanding how to troubleshoot and eliminate defects on a coating line is an essential skill for all personnel.
Coating and Drying Defects, Second Edition provides manufacturing and quality control personnel, equipment operators and supervisors, and plant engineers and scientists with the full complement of proven tools and techniques for detecting, defining, and eliminating coating defects and operating problems, and for ensuring that they do not recur.
Updating the valuable contents of the first edition, this practical Second Edition:Describes all major processes for coating and drying of continuous film on sheets or webs Covers technologies that have been recently developed to prevent defect formation and improve operating procedures Provides a rational framework within which to assess and analyze virtually any defect that may arise Offers step-by-step guidelines for conducting every phase of the troubleshooting process, including defect prevention Going beyond simply describing a disparate set of troubleshooting techniques, this unique guide arms readers with a systematic, nonmathematical methodology encompassing the entire coating operation, becoming an indispensable resource for manufacturing and quality-control personnel as well as plant engineers, polymer scientists, surface scientists, organic chemists, and coating scientists.
This text offers a thorough overview of the operating characteristics, efficiencies, design features, troubleshooting, and maintenance of dynamic and positive displacement process gas compressors. The author examines a wide spectrum of compressors used in heavy process industries, with an emphasis on improving reliability and avoiding failure. Readers learn both the theory underlying compressors as well as the myriad day-to-day practical issues and challenges that chemical engineers and plant operation personnel must address.
The text features:Latest design and manufacturing details of dynamic and positive displacement process gas compressors Examination of the full range of machines available for the heavy process industries Thorough presentation of the arrangements, material composition, and basic laws governing the design of all important process gas compressors Guidance on selecting optimum compressor configurations, controls, components, and auxiliaries to maximize reliability Monitoring and performance analysis for optimal machinery condition Systematic methods to avoid failure through the application of field-tested reliability enhancement concepts Fluid instability and externally pressurized bearings Reliability-driven asset management strategies for compressors Upstream separator and filter issues
The text's structure is carefully designed to build knowledge and skills by starting with key principles and then moving to more advanced material. Hundreds of photos depicting various types of compressors, components, and processes are provided throughout.
Compressors often represent a multi-million dollar investment for such applications as petrochemical processing and refining, refrigeration, pipeline transport, and turbochargers and superchargers for internal combustion engines. This text enables the broad range of engineers and plant managers who work with these compressors to make the most of the investment by leading them to the best decisions for selecting, operating, upgrading, maintaining, and troubleshooting.
* The first reference work on named reactions to present colored schemes for easier understanding
* 250 frequently used named reactions are presented in a convenient two-page layout with numerous examples
* An opening list of abbreviations includes both structures and chemical names
* Contains more than 10,000 references grouped by seminal papers, reviews, modifications, and theoretical works
* Appendices list reactions in order of discovery, group by contemporary usage, and provide additional study tools
* Extensive index quickly locates information using words found in text and drawings
From the Trade Paperback edition.
The book uses SI units in accordance with international industry and covers topics such as chronological development, industrial applications, air separation technologies, noble gases, front end purification systems, insulation, non-cryogenic separation, safety, cleaning for oxygen systems, economics, and product liquefaction, storage, and transportation.
No other book currently available takes the practical approach of this book — they are either outdated, too theoretical, or narrow in focus. In a clear and effective presentation, Industrial Gas Handbook: Gas Separation and Purification covers the principles and applications of industrial gas separation and purification.
An international effort and industry-academia collaboration, this volume features expert contributions, focusing on the contemporary state-of-the-art concerning the many facets of the production of detergents and surfactants.
Thus, the Handbook of Detergents, Part F – Production, deals with the production of anionic, cationic, nonionic, and amphoteric surfactants, key builders, bleaching and whitening agents, enzymes and other components of detergent formulations in different contexts, gauges and related concerns, and discusses various technological procedures of production processes involving the components of surfactants and detergents.