The Physics and Technology of Ion Sources: Edition 2

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The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.
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About the author

Ian Brown is a Senior Physicist at the Lawrence Berkeley national Laboratory, Berkeley, California. His research interests include the development of plasma and ion sources and their application for materials synthesis and modification. In 1984 he established the Plasma Applications Group at the Berkeley Laboratory and was Group Leader there until his retirement in 2001. He maintains an interest in ongoing research and is actively involved in a number of collaborative research programs; his work on vacuum arc ion sources and materials surface modification has won several awards.
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Additional Information

Publisher
John Wiley & Sons
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Published on
Mar 6, 2006
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Pages
396
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ISBN
9783527604548
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Best For
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Language
English
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Genres
Science / Physics / Atomic & Molecular
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Content Protection
This content is DRM protected.
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The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application.
The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources.
The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies.
Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized.
The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.
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