I-wafer ye-photoresist ihlala ngaphansi kwesibani, kanti umoya obuthakathaka phezu kwegridi yiphethini okumele iphume kunjiniyela. Cindezela bese uhudula ukuze uhambise ikhanda le-UV phezu kwe-wafer: noma yiliphi iseli elihlala phezu kwalo liqala ukuthatha umthamo, bese umthamo uhlala lapho lihlala khona. Amaseli angaphansi kwephethini kufanele akhushulwe efasiteleni lawo - mancane kakhulu futhi ngeke avuleke, amaningi kakhulu futhi i-resist iyasha futhi i-wafer yonke ishiywe. Amaseli angaphandle kwephethini kufanele aqondiswe nxazonke kunokuba aqhutshwe. Vula yonke iseli engaphansi kwephethini ukuze uqedele i-wafer; ngemva kwalokho amaphethini ayahlakazeka kakhulu, ifasitela liyancipha, futhi indawo yesibani iba ncane.
I-Mask Light Development ngumdlalo ongajwayelekile
Kubuyekezwe ngo-
Sep 30, 2026