关于此电子书
Most of the applications of these processes are kept as confidential as possible (proprietary information), and specific details are not seen in professional or technical journals and magazines. This book makes these processes and applications accessible to a wider industrial and academic audience.
Building on the fundamentals of tribology – the science of friction, wear and lubrication – the authors explore the practical applications of CMP and polishing across various market sectors. Due to the high pace of development of the electronics and semiconductors industry, many of the presented processes and applications come from these industries.
- Demystifies scientific developments and technological innovations, opening them up for new applications and process improvements in the semiconductor industry and other areas of precision engineering
- Explores stock removal mechanisms in CMP and polishing, and the challenges involved in predicting the outcomes of abrasive processes in high-precision environments
- The authors bring together the latest innovations and research from the USA and Japan
作者简介
Ioan D. Marinescu is Professor and Director of the Precision Micromachining Center at The University of Toledo, Ohio, USA, and CEO of Advanced Manufacturing Solutions, LLC. His research interests include manufacturing processes, grinding, tribology, advanced materials, and machining of brittle materials.
